(i)chromatographic Methods For Solute Descriptor Determinations (ii)ruthenium Substrate-Catalyzed Growth Of Nickel Nitride Thin Films By Atomic Layer Deposition

نویسندگان

  • Thiloka Chandima Ariyasena
  • Priyanga Wijesinghe
  • Shawn P. McElmurry
چکیده

(I) CHROMATOGRAPHIC METHODS FOR SOLUTE DESCRIPTORDETERMINATIONS(II) RUTHENIUM SUBSTRATE-CATALYZED GROWTH OF NICKEL NITRIDETHIN FILMS BY ATOMIC LAYER DEPOSITION

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Evaluation of the Effect of Ni-Co NPs for the Effective Growth of Carbon Nanotubes by TCVD System

A systematic study was conducted to understand the influences of catalyst combination as Ni-Co NPs on carbon nanotubes (CNTs) grown by Chemical Vapor Deposition (TCVD). The DC-sputtering system was used to prepare Co and Ni-Co thin films on silicon substrate. Ni- Co nanoparticles were used as metal catalyst for growing carbon nanotubes from acetylene (C2H2) gas in 850 ̊ C during 15 min. Carb...

متن کامل

Atomic Layer Deposition of Ruthenium Thin Films from an Amidinate Precursor

Ruthenium thin films are deposited by atomic layer deposition (ALD) from bis(N,N’-di-tert-butylacetamidinato)ruthenium(II) dicarbonyl and O2. Highly conductive, dense, and pure thin films can be deposited when oxygen exposure, EO, approaches a certain threshold (Emax). When EO>Emax the film peels off due to the recombinative desorption of O2 at the film/substrate interface. Analysis by atomic p...

متن کامل

Mechanical Properties and Microstructural Evolution of Ta/TaNx Double Layer Thin Films Deposited by Magnetron Sputtering

Crystalline tantalum thin films of about 500nm thickness were deposited on AISI 316L stainless steel substrate using magnetron sputtering. To investigate the nano-mechanical properties of tantalum films, deposition was performed at two temperatures (25°C and 200°C) on TaNx intermediate layer with different N2/Ar flow rate ratio from 0 to 30%. Nano-indentation was performed to obtain the mechani...

متن کامل

Thin, Continuous, and Conformal Copper Films by Reduction of Atomic Layer Deposited Copper Nitride

Thin and continuous copper films serve as seed layers for electrodeposition of interconnects in microelectronic devices. Gaps in the continuity of these Cu films must be avoided, because they can generate voids that later lead to failure of the devices. It is difficult to sputter completely continuous copper-seed layers into the increasingly narrow trenches and holes in modern interconnects. He...

متن کامل

Two-Stage Chemical Deposition of Oxide Films

Two-stage chemical deposition (TSCD) technique is used to produce ZnO, Mn2O3 and NiO films on soda-lime glass (SL-G) from an aqueous solution of zinc, manganese and nickel complex, respectively. The TSCD method enables the deposition of metal oxide thin films with a thickness which can be controlled during the preparation procedure. The ZnO, Mn2O3 and NiO thin films were polycrystalline films w...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2015